resist spin soft bake expose hard bake develop target thickness Other steps
             
SPR510A 30 s at 4 krpm 1.5 min at 90 C stepper: ~ 0.95 s 1 min at 105 C ~1 min ~ 1.1 micron
          in MF701  
AZ 4620 ramp up to 100 s at 110 C stepper: ~1.65 s            - ~1.5 min ~7.4 microns
  30 s at 4 krpm   Karl Suss: ~20s   in AZ 400K 1:4  
             
SPR518 30 s at 3krpm 1 min at 90 C Stepper~ 1.1 s Focus Offset=12?? 1 min at 105 C 90 s in MF701 ~2.1 microns Rinse in Di 3 min after developing
AZ4210 5K for 30sec 95 for 1min Stepper ~0.64 sec    AZ400K 1:4 for 65 sec/150 if hardbaked 2.1 microns  
               
SPR 950 3.5K for 30 sec 90C for 1 min 1.7sec in Stepper 2min at 100C Rinse in DI 30 sec PRIOR to develop in MF701 2min 20sec 0.8 microns Spin 365CEM at 3.5Kb/w 3 and 4 for 30 sec for contrast enhancement.
SPR220-7.0 3.0K for 30 sec 90 C for 100sec + 100C for 100 sec Stepper: ~4sec             Contact Aligner:      ~30 sec 115C for 90 sec 60-90sec in MF701 7.5 microns Hold time ~30 mins between exposure and Hard bake
AZ 9260 3.0K for 30 sec 110 C for 80 sec: 10um: then 2nd coat 6.5 sec in stepper None AZ 400K 1:4 for 300 sec   AZ300T at   80C for stripping
3.0K for 30 sec 110 C for 160 sec: total 24 um       24um